![]() ![]() ![]() The instrument system can be employed in fully-automated, in-process computer-controlled wafer inspection, measuring and handling lines as a central component. The observer (47) can carry out all necessary microexamination and handling functions from ergonomically-designed control panels (45, 55), which are all located outside of the critical object region on the instrument. In all embodiments, contamination-free handling and inspection of large-surface-area objects (6), particularly wafers, is achieved by the establishment of a laminar flow, acting in the region of the object. The angular deflection α between the vertical plane (63) and the object stage plane, and thus the angular deflection between the horizontal and the optical axis (7), can be up to 30° in both versions, according to the condition: 0°≤α≤30°. A vertical object stage (5), to which the horizontally-extending optical axis (7) is perpendicular, is located between the two stand parts (11 12). An alternative embodiment of the microscope casing comprises at least two vertical stand parts (11 12) which are connected together by a stand plate (13) and-as seen by the observer (47)-are arranged one behind the other. Transmitted-light and/or reflected-light microscope in closed or open vertical-frame stand design (1 2) having a vertical object stage plane (5) and a horizontal optical microscope axis (7) which is perpendicular to the object stage (5). ![]()
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January 2023
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